PlasmaSolve Helps Develop Halogen-free Etching Processes for the Semiconductor Industry

Since October 2024, PlasmaSolve has been an active member of the EU-wide project HaloFreeEtch. Our role in the project is to help develop halogen-free chemistries for etching of silicon and silicon dioxide in semiconductor applications and use models to implement these processes in industrial etching tools.

More information about the project follows below.

HaloFreeEtch aims to revolutionize the semiconductor manufacturing industry by developing new, sustainable, halogen-free etching processes for silicon and silicon oxide. Traditional industrial plasma etching processes rely on halogens, which pose significant environmental and health risks. By replacing these with more sustainable alternatives, the project seeks to reduce the carbon footprint and improve the overall sustainability of semiconductor manufacturing. 

Objectives 

The core objectives of HaloFreeEtch include: 

• Development of Novel Etching Processes: Identifying and developing clean, efficient, and precise halogen-free etching processes. 

• Sustainability and Life Cycle Analysis: Providing a novel model- and data-based methodology to quantify the carbon footprint of new etching processes. 

• Interdisciplinary Research: Combining lab-scale research with computational screening and multi-scale modeling to predict potential working points for new etching methods. 

• Industrial Application: Modifying state-of-the-art plasma etching machines and combining them with innovative features and advanced analytics to ensure applicability in industrial settings. 

  
  

Significance 

With the semiconductor industry at the heart of technological innovation, developing sustainable manufacturing processes is crucial for the environment and the industry's future. The HaloFreeEtch project aims to position Europe at the forefront of this green transition, contributing to the global effort to reduce environmental impact and promote sustainable practices.  Project number: 101161153

Project name: Novel approaches for halogen-free and sustainable etching of Silicon and Glass

Project acronym: HaloFreeEtch

Topic: HORIZON-EIC-2023-PATHFINDERCHALLENGES-01-04

Type of action: HORIZON-EIC

Project starting date: 1 September 2024

Project duration: 48 months

EU Contribution: 3.997.735,00 Euro